Silicon Crystal Growth and Wafer Technologies
Author(s) -
Graham Fisher,
Michael R. Seacrist,
Robert W. Standley
Publication year - 2012
Publication title -
proceedings of the ieee
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.383
H-Index - 287
eISSN - 1558-2256
pISSN - 0018-9219
DOI - 10.1109/jproc.2012.2189786
Subject(s) - general topics for engineers , engineering profession , aerospace , bioengineering , components, circuits, devices and systems , computing and processing , engineered materials, dielectrics and plasmas , fields, waves and electromagnetics , geoscience , nuclear engineering , robotics and control systems , signal processing and analysis , transportation , power, energy and industry applications , communication, networking and broadcast technologies , photonics and electrooptics
Silicon substrates form the foundation of modern microelectronics. Whereas the first 50 years of silicon wafer technology were primarily driven by the microelectronics industry, applications in photovoltaics (PV) also promise to drive new advances in silicon wafer technology over the next ten years. In the first part, we review the historical development of semiconductor silicon wafer technology and highlight recent technical advances in bulk crystal growth and wafering technologies, including the development of silicon-on-insulator (SOI) technologies and ultrathin wafers. We then discuss technologies that could take us beyond the current capabilities of complementary metal-oxide-semiconductor (CMOS) devices. In the second part, we review silicon manufacturing for PV applications and some unique wafering technology challenges in that field. Finally, we summarize industry roadmaps and product needs highlighting key technical areas which promise to shape the future of silicon wafer technologies in the coming decades.
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