On the Small-Signal Capacitance of RF MEMS Switches at Very Low Frequencies
Author(s) -
Jiahui Wang,
Jeroen Bielen,
Cora Salm,
Gijs Krijnen,
Jurriaan Schmitz
Publication year - 2016
Publication title -
ieee journal of the electron devices society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.69
H-Index - 31
ISSN - 2168-6734
DOI - 10.1109/jeds.2016.2602261
Subject(s) - components, circuits, devices and systems , engineered materials, dielectrics and plasmas
This paper presents on-wafer capacitance measurements of silicon-based RF MEMS capacitive switches down to frequencies below 1 Hz. The capacitance-voltage (C-V) curve measured at very-low frequency (0.01-10 Hz) deviates from the commonly measured and well-understood high-frequency C-V curve, especially near the pull-in and pull-out voltages. This behavior is explained from the mechanical action of the top electrode. An electrostatic transducer model is used to express the coupling between mechanical and electrical behavior of the device under study. The mechanical action and air damping play an important role at the lower measurement frequencies, as confirmed by vibrometer measurements, FEM modeling and experiments at reduced pressure.
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