z-logo
open-access-imgOpen Access
Reliability and yield: a joint defect-oriented approach
Author(s) -
Roman Barsky,
Israel A. Wagner
Publication year - 2004
Publication title -
19th ieee international symposium on defect and fault tolerance in vlsi systems, 2004. dft 2004. proceedings.
Language(s) - English
DOI - 10.1109/dft.2004.51
We present a model for computing the probability of a parametric failure due to a spot defect. The analysis is based on electromigration in conductors under unidirectional current stress. An analytical solution is given for simple layout and simulations for a more complicated case. Then we show that in some cases electromigration-dependent parametric defects can make a significant contribution to the total yield estimation.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom