Open AccessRepeatability and sensitivity characterization of the far‐field high‐energy diffraction microscopy instrument at the Advanced Photon Source
Author(s) -
Park Jun-Sang,
Sharma Hemant,
Kenesei Peter
Publication year - 2021
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577521008286
Subject(s) - repeatability , advanced photon source , diffraction , optics , rotation (mathematics) , characterization (materials science) , sensitivity (control systems) , microscopy , translation (biology) , synchrotron , orientation (vector space) , light source , physics , computer science , particle accelerator , beam (structure) , artificial intelligence , chemistry , statistics , mathematics , engineering , biochemistry , geometry , electronic engineering , messenger rna , gene
In the last two decades, far‐field high‐energy diffraction microscopy (FF‐HEDM) and similar non‐destructive techniques have been actively developed at synchrotron light sources around the world. As these techniques (and associated analysis tools) are becoming more available for the general users of these light sources, it is important and timely to characterize their performance and capabilities. In this work, the FF‐HEDM instrument implemented at the 1‐ID‐E endstation of the Advanced Photon Source (APS) is summarized. The set of measurements conducted to characterize the instrument's repeatability and sensitivity to changes in grain orientation and position are also described. When an appropriate grain matching method is used, the FF‐HEDM instrument's repeatability is approximately 5 µm in translation, 0.02° in rotation, and 2 × 10 −4 in strain; the instrument sensitivity is approximately 5 µm in translation and 0.05° in rotation.