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Colloquium:Reactive plasmas as a versatile nanofabrication tool
Author(s) -
Kostya Ostrikov
Publication year - 2005
Publication title -
reviews of modern physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 24.877
H-Index - 363
eISSN - 1538-4527
pISSN - 0034-6861
DOI - 10.1103/revmodphys.77.489
Subject(s) - nanolithography , nanotechnology , plasma , physics , silicon , materials science , optoelectronics , fabrication , nuclear physics , medicine , alternative medicine , pathology
The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the "cause and effect" approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline TiO2 coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed. © 2005 The American Physical Society

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