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Enhancement of magnetic properties in compressively strained PrVO3 thin films
Author(s) -
D. Kumar,
Arnaud Fouchet,
Adrian David,
Aïmane Cheikh,
T. S. Suraj,
O. Copie,
C. U. Jung,
A. Pautrat,
M. S. Ramachandra Rao,
W. Prellier
Publication year - 2019
Publication title -
physical review materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.439
H-Index - 42
eISSN - 2476-0455
pISSN - 2475-9953
DOI - 10.1103/physrevmaterials.3.124413
Subject(s) - materials science , epitaxy , lattice constant , paramagnetism , pulsed laser deposition , thin film , coercivity , analytical chemistry (journal) , condensed matter physics , crystallography , nuclear magnetic resonance , layer (electronics) , diffraction , nanotechnology , optics , physics , chemistry , chromatography

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