Variable chemical decoration of extended defects in Cu-poor C u 2 ZnSnS e 4 thin films
Author(s) -
Torsten Schwarz,
Alex Redinger,
Susanne Siebentritt,
Zirong Peng,
Baptiste Gault,
Dierk Raabe,
PyuckPa Choi
Publication year - 2019
Publication title -
physical review materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.439
H-Index - 42
eISSN - 2476-0455
pISSN - 2475-9953
DOI - 10.1103/physrevmaterials.3.035402
Subject(s) - materials science , grain boundary , annealing (glass) , crystallography , stacking , analytical chemistry (journal) , microstructure , metallurgy , nuclear magnetic resonance , physics , chemistry , chromatography
Torsten Schwarz,1,* Alex Redinger,2 Susanne Siebentritt,2 Zirong Peng,1 Baptiste Gault,1 Dierk Raabe,1 and Pyuck-Pa Choi3,† 1Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Straβe 1, 40237 Düsseldorf, Germany 2Laboratory for Photovoltaics, Physics and Materials Science Research Unit, University of Luxembourg, Belvaux, L-4422, Luxembourg 3Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-338, Republic of Korea
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