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Origin of Charge Density atLaAlO3onSrTiO3Heterointerfaces: Possibility of Intrinsic Doping
Author(s) -
Wolter Siemons,
Gertjan Koster,
Hideki Yamamoto,
Walter A. Harrison,
G. Lucovsky,
T. H. Geballe,
Dave H. A. Blank,
M. R. Beasley
Publication year - 2007
Publication title -
physical review letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.688
H-Index - 673
eISSN - 1079-7114
pISSN - 0031-9007
DOI - 10.1103/physrevlett.98.196802
Subject(s) - annealing (glass) , materials science , limiting , dielectric , charge carrier density , redistribution (election) , oxygen , charge (physics) , analytical chemistry (journal) , physics , doping , optoelectronics , chemistry , mechanical engineering , quantum mechanics , chromatography , politics , political science , law , engineering , composite material
As discovered by Ohtomo and Hwang, a large sheet charge density with high mobility exists at the interface between SrTiO{sub 3} and LaAlO{sub 3}. Based on transport, spectroscopic, and oxygen-annealing experiments, we conclude that extrinsic defects in the form of oxygen vacancies introduced by the pulsed laser deposition process used by all researchers to date to make these samples is the source of the large carrier densities. Annealing experiments show a limiting carrier density. We also present a model that explains the high mobility based on carrier redistribution due to an increased dielectric constant

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