Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas | Zendy

Shinsuke Fujioka | Zendy; Hiroaki Nishimura | Zendy; Katsunobu Nishihara | Zendy; Akira Sasaki | Zendy; Atsushi Sunahara | Zendy; T. Okuno | Zendy; Nobuyoshi Ueda | Zendy; Tsuyoshi Andô | Zendy; Yezheng Tao | Zendy; Yoshinori Shimada | Zendy; Kazuhisa Hashimoto | Zendy; Michiteru Yamaura | Zendy; K. Shigemori | Zendy; M. Nakai | Zendy; Keiji Nagai | Zendy; T. Norimatsu | Zendy; Takeshi Nishikawa | Zendy; N. Miyanaga | Zendy; Yasukazu Izawa | Zendy; K. Mima | Zendy

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Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

Author(s) -

Shinsuke Fujioka,

Hiroaki Nishimura,

Katsunobu Nishihara,

Akira Sasaki,

Atsushi Sunahara,

T. Okuno,

Nobuyoshi Ueda,

Tsuyoshi Andô,

Yezheng Tao,

Yoshinori Shimada,

Kazuhisa Hashimoto,

Michiteru Yamaura,

K. Shigemori,

M. Nakai,

Keiji Nagai,

T. Norimatsu,

Takeshi Nishikawa,

N. Miyanaga,

Yasukazu Izawa,

K. Mima

Publication year - 2005

Publication title -

physical review letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.688

H-Index - 673

eISSN - 1079-7114

pISSN - 0031-9007

DOI - 10.1103/physrevlett.95.235004

Subject(s) - extreme ultraviolet lithography , opacity , extreme ultraviolet , plasma , laser , materials science , tin , radiation , wavelength , optics , ultraviolet , energy conversion efficiency , optoelectronics , physics , metallurgy , quantum mechanics

Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9-19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.

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