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Characteristics of Electron Heat Transport of Plasma with an Electron Internal-Transport Barrier in the Large Helical Device
Author(s) -
K. Ida,
Τ. Shimozuma,
H. Funaba,
K. Narihara,
S. Kubo,
S. Murakami,
A. Wakasa,
M. Yokoyama,
Y. Takeiri,
K. Y. Watanabe,
K. Tanaka,
M. Yoshinuma,
Y. Liang,
N. Ohyabu
Publication year - 2003
Publication title -
physical review letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.688
H-Index - 673
eISSN - 1079-7114
pISSN - 0031-9007
DOI - 10.1103/physrevlett.91.085003
Subject(s) - thermal diffusivity , plasma , electron , atomic physics , materials science , electron temperature , large helical device , ion , electron transport chain , electron cyclotron resonance , diffusion , thermal , physics , chemistry , thermodynamics , nuclear physics , biochemistry , quantum mechanics
Associated with the transition from ion root to electron root, an electron internal transport barrier (ITB) appears in the large helical device, when the heating power of electron cyclotron resonance heating exceeds the threshold power. The incremental thermal diffusivity of electron heat transport chi(inc)(e) in the ITB plasma is much lower than that in the plasma with the heating power below the threshold, and the thermal diffusivity chi(e) decreases with increasing of heating power [dchi(e)/d(P/n(e))<0] in helical ITB plasmas.

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