Kinetically Assisted Potential Sputtering of Insulators by Highly Charged Ions | Zendy

G. Hayderer | Zendy; S. Cernusca | Zendy; Michael Schmid | Zendy; П. Варга | Zendy; HP. Winter | Zendy; F. Aumayr | Zendy; D. Niemann | Zendy; Volker Hoffmann | Zendy; N. Stolterfoht | Zendy; C. Lemell | Zendy; Ludger Wirtz | Zendy; Joachim Burgdörfer | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Kinetically Assisted Potential Sputtering of Insulators by Highly Charged Ions

Author(s) -

G. Hayderer,

S. Cernusca,

Michael Schmid,

П. Варга,

HP. Winter,

F. Aumayr,

D. Niemann,

Volker Hoffmann,

N. Stolterfoht,

C. Lemell,

Ludger Wirtz,

Joachim Burgdörfer

Publication year - 2001

Publication title -

physical review letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.688

H-Index - 673

eISSN - 1079-7114

pISSN - 0031-9007

DOI - 10.1103/physrevlett.86.3530

Subject(s) - sputtering , ion , materials science , halide , cascade , collision cascade , atomic physics , alkali metal , excitation , chemical physics , nanotechnology , thin film , physics , inorganic chemistry , chemistry , chromatography , quantum mechanics

A new form of potential sputtering has been found for impact of slow ( < or = 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgO(x). In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering process. This kinetically assisted potential sputtering mechanism has been identified to be present for other insulating surfaces as well.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research