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Coarsening Mechanisms in a Metal Film: From Cluster Diffusion to Vacancy Ripening
Author(s) -
Jianming Wen,
J. W. Evans,
M. C. Bartelt,
Joseph W. Burnett,
P. A. Thiel
Publication year - 1996
Publication title -
physical review letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.688
H-Index - 673
eISSN - 1079-7114
pISSN - 0031-9007
DOI - 10.1103/physrevlett.76.652
Subject(s) - ostwald ripening , monolayer , materials science , vacancy defect , coalescence (physics) , cluster (spacecraft) , thermal diffusivity , chemical physics , diffusion , condensed matter physics , cluster size , crystallography , nanotechnology , thermodynamics , chemistry , physics , computer science , programming language , electronic structure , astrobiology
Coarsening of Ag films on Ag(100) at room temperature occurs primarily via diffusion-mediated coalescence of two-dimensional adatom clusters, rather than by Ostwald ripening, up to a coverage of 0.65 monolayer. Above 0.8 monolayer, vacancy clusters coarsen primarily via Ostwald ripening, due to their much lower diffusivity. An asymmetric transition region separates these two regimes, characterized by a near-percolating structure which undergoes self-similar coarsening. {copyright} {ital 1996 The American Physical Society.}

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