Open AccessLiquid-vapor density profile of helium: An x-ray study
Author(s) -
Laurence Lurio,
T. A. Rabedeau,
P. S. Pershan,
Isaac F. Silvera,
Moshe Deutsch,
S. D. Kosowsky,
B. M. Ocko
Publication year - 1992
Publication title -
physical review letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.688
H-Index - 673
eISSN - 1079-7114
pISSN - 0031-9007
DOI - 10.1103/physrevlett.68.2628
Subject(s) - materials science , substrate (aquarium) , liquid helium , silicon , helium , x ray , asymmetry , analytical chemistry (journal) , helium 4 , area density , atomic physics , optics , physics , chemistry , composite material , optoelectronics , oceanography , quantum mechanics , chromatography , geology
The average liquid-vapor density profiles {l angle}{rho}({ital z}){r angle} of thick {sup 4}He films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2{plus minus}1 A at 1.13 K which extrapolates to a {ital T}=0 K, 90%-10% interfacial width of 7.6+1,{minus}2 A. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed.
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