Open AccessExtended Charge Layers in Metal-Oxide-Semiconductor Nanocapacitors Revealed by Operando Electron Holography
Author(s) -
Christophe Gatel,
R. Serra,
Kilian Gruel,
Aurélien Massebœuf,
Laura Chapuis,
Robin Cours,
Leifeng Zhang,
B. Warot-Fonrose,
Martin Hÿtch
Publication year - 2022
Publication title -
physical review letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.688
H-Index - 673
eISSN - 1079-7114
pISSN - 0031-9007
DOI - 10.1103/physrevlett.129.137701
Subject(s) - capacitor , materials science , electron holography , semiconductor , dielectric , optoelectronics , silicon , ferroelectricity , electric field , electron , silicon dioxide , oxide , holography , nanotechnology , engineering physics , voltage , electrical engineering , optics , physics , quantum mechanics , transmission electron microscopy , metallurgy , engineering
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