Energetics of Cu adsorption and intercalation at graphite step edges
Author(s) -
Yong Han,
Ann Lii-Rosales,
Michael C. Tringides,
James W. Evans,
P. A. Thiel
Publication year - 2019
Publication title -
physical review. b./physical review. b
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.78
H-Index - 465
eISSN - 2469-9969
pISSN - 2469-9950
DOI - 10.1103/physrevb.99.115415
Subject(s) - intercalation (chemistry) , graphite , atom (system on chip) , binding energy , materials science , energetics , diffusion , adsorption , zigzag , crystallography , chemical physics , atomic physics , chemistry , thermodynamics , inorganic chemistry , physics , geometry , composite material , mathematics , computer science , embedded system
To assess the energetics of Cu intercalation on defective graphite, the chemical potentials and binding energies for Cu at graphite step edges are calculated for three main configurations: an isolated atom, a chain, and an atom attached to a chain. As expected, for Cu interacting directly with a graphite step edge, the strength of interaction depends on the stability of the step, with Cu binding more strongly at a less-stable step. However, the relationship is reversed when considering binding of a Cu atom attached to a chain. Taken together, these trends mean that if the graphite step is less stable, as for the zigzag step, then decorating the step with a Cu chain facilitates intercalation by additional Cu atoms (which are less strongly bound to the decorated step). For more stable steps, intercalation is optimal without decoration. We also calculate the diffusion barrier for atomic Cu on top of the graphite terrace and, in the uppermost gallery, find values of 0.008 and 0.021 eV, respectively. These values are very small, indicating that the minimum barrier for a Cu atom to detach from a step and move to a terrace or gallery is dominated by the difference in binding energies. For intercalation, this minimum barrier is 1.4 to 3.1 eV and depends strongly on step configuration.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom