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Strain-induced metal-semiconductor transition in monolayers and bilayers of gray arsenic: A computational study
Author(s) -
Zhen Zhu,
Jie Guan,
David Tománek
Publication year - 2015
Publication title -
physical review b
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.91.161404
Subject(s) - materials science , monolayer , semiconductor , stacking , condensed matter physics , density functional theory , transition metal , band gap , ab initio , thin film , semimetal , valence (chemistry) , arsenic , metal , nanotechnology , computational chemistry , chemistry , optoelectronics , nuclear magnetic resonance , physics , biochemistry , organic chemistry , metallurgy , catalysis
We study the equilibrium geometry and electronic structure of thin films of layered gray arsenic using ab initio density functional theory. In contrast to bulk gray As that is semimetallic, thin films display a significant band gap that depends sensitively on the number of layers, in-layer strain, layer stacking, and interlayer spacing. We find that metallic character can be introduced by increasing the number of layers beyond two or by subjecting semiconducting monolayers and bilayers to moderate tensile strain. The strain-induced metal-semiconductor transition is triggered by changes in the band ordering near the top of the valence band that causes an abrupt change from σ to π character of the frontier states.

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