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Electron mean free path of tungsten and the electrical resistivity of epitaxial (110) tungsten films
Author(s) -
Dooho Choi,
Chang Soo Kim,
Doron Naveh,
Suk Jae Chung,
Andrew P. Warren,
Noel T. Nuhfer,
Michael F. Toney,
Kevin R. Coffey,
Katayun Barmak
Publication year - 2012
Publication title -
physical review b
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.86.045432
Subject(s) - electrical resistivity and conductivity , materials science , tungsten , annealing (glass) , condensed matter physics , epitaxy , scattering , mean free path , specularity , electron scattering , nanotechnology , optics , composite material , physics , metallurgy , quantum mechanics , layer (electronics) , specular reflection
Dooho Choi,1 Chang Soo Kim,2 Doron Naveh,2 Suk Chung,1 Andrew P. Warren,3 Noel T. Nuhfer,1 Michael F. Toney,4 Kevin R. Coffey,3 and Katayun Barmak1 1Department of Materials Science and Engineering, Carnegie Mellon University, 5000 Forbes Avenue, Pittsburgh, Pennsylvania, 15213, USA 2Department of Electrical and Computer Engineering, Carnegie Mellon University, 5000 Forbes Avenue, Pittsburgh, Pennsylvania 15213, USA 3Advanced Materials Processing and Analysis Center, University of Central Florida, 4000 Central Florida Boulevard, Orlando, Florida 32816, USA 4Stanford Synchrotron Radiation Lightsource, 2575 Sand Hill Road, Menlo Park, California 94025, USA (Received 18 November 2011; revised manuscript received 12 June 2012; published 23 July 2012)

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