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Epitaxial suppression of the metal-insulator transition in CrN
Author(s) -
X. Y. Zhang,
J. S. Chawla,
R. P. Deng,
Daniel Gall
Publication year - 2011
Publication title -
physical review b
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.84.073101
Subject(s) - materials science , orthorhombic crystal system , crystallite , epitaxy , condensed matter physics , phase (matter) , metal–insulator transition , phase transition , metal , crystallography , crystal structure , nanotechnology , metallurgy , physics , chemistry , quantum mechanics , layer (electronics)
Both single- and polycrystalline CrN layers are grown by reactive sputtering on MgO and quartz substrates, respectively. Temperature-dependent x-ray diffraction indicates a phase transition near 280 K to a low-temperature orthorhombic phase for polycrystalline CrN, while epitaxial constraints cause single-crystal CrN(001) and CrN(111) to remain in the cubic high-temperature phase. Electronic transport measurements indicate variable-range-hopping for the cubic phase below \ensuremath{\sim}120 K, a discontinuity at the phase transition for the polycrystalline layers, strongly and weakly disordered metallic conduction for the orthorhombic phase if deposited at 600 and 800 \ifmmode^\circ\else\textdegree\fi{}C, respectively, and a disorder-induced metal-insulator transition in the cubic phase.

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