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Analysis of x-ray linear dichroism spectra for NiO thin films grown on vicinal Ag(001)
Author(s) -
Yizheng Wu,
Yarui Zhao,
Elke Arenholz,
A. T. Young,
B. Sinković,
C. Won,
Z. Q. Qiu
Publication year - 2008
Publication title -
physical review b
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.78.064413
Subject(s) - vicinal , materials science , non blocking i/o , condensed matter physics , spins , linear dichroism , antiferromagnetism , thin film , epitaxy , absorption edge , magnetic circular dichroism , absorption spectroscopy , substrate (aquarium) , spectral line , crystallography , molecular physics , optics , physics , optoelectronics , layer (electronics) , nanotechnology , circular dichroism , chemistry , band gap , oceanography , quantum mechanics , geology , biochemistry , astronomy , catalysis
Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spin exhibits an in-plane spin reorientation transition from parallel to perpendicular to the step edges with increasing the NiO film thickness. In addition to the conventional L{sub 2} adsorption edge, x-ray linear dichroism (XLD) effect at the Ni L{sub 3} adsorption edge is also measured and analyzed. The result identifies a small energy shift of the L{sub 3} peak. Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x-rays originates entirely from the NiO magnetic ordering

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