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Thickness dependence of Hall transport inNi1.15Mn0.85Sbthin films on silicon
Author(s) -
W. R. Branford,
S. K. Clowes,
Yu.V. Bugoslavsky,
S. Gardelis,
John Androulakis,
J. Giapintzakis,
C.E.A. Grigorescu,
Stefan A. Manea,
R. S. Freitas,
Sthitadhi Roy,
L. F. Cohen
Publication year - 2004
Publication title -
physical review b
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.69.201305
Subject(s) - spintronics , condensed matter physics , materials science , hall effect , magnetic semiconductor , ferromagnetism , ternary operation , electrical resistivity and conductivity , physics , quantum mechanics , computer science , programming language

Highly spin polarized Heusler alloys, NiMnSb and Co2MnSi, attract a great deal of interest as potential spin injectors for spintronic applications. Spintronic devices require control of interfacial properties at the ferromagnet:semiconductor contact. To address this issue we report a systematic study of the ordinary and anomalous Hall effect, in Ni1.15Mn0.85Sb films on silicon, as a function of film thickness. In contrast to the bulk stoichiometric material, the Hall carriers in these films become increasingly electron-like as the film thickness decreases, and as the temperature increases from 50 K toward room temperature. High field Hall measurements confirm that this is representative of the majority transport carriers. This suggests that current injected from a NiMnSb:semiconductor interface may not necessarily carry the bulk spin polarization. The films also show a low temperature upturn in the resistivity, which is linked to a discontinuity in the anomalous Hall coefficient. Overall these trends indicate that the application of Heusler alloys as spin injectors will require strictly controlled interfacial engineering, which is likely to be demanding in these ternary alloys.

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