Dissipative continuum model for self-organized pattern formation during ion-beam erosion
Author(s) -
Stefan Facsko,
T. Bobek,
Achim Stahl,
H. Kurz,
T. Dekorsy
Publication year - 2004
Publication title -
physical review b
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.69.153412
Subject(s) - dissipative system , ion , pattern formation , physics , hexagonal crystal system , range (aeronautics) , ion beam , condensed matter physics , materials science , quantum mechanics , biology , chemistry , composite material , crystallography , genetics
A continuum model, based on the damped Kuramoto-Sivashinsky equation, is shown to reproduce the morphology evolution during ion sputtering quite successfully. In a very narrow range of the damping parameter $\ensuremath{\alpha},$ the alignment of the structures into hexagonal domains is obtained under normal incidence of ions with striking resemblance to the experimentally observed dot patterns. The origin of this damping factor is discussed.
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