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Electrical conductance of reconstructed silicon surfaces
Author(s) -
Kwonjae Yoo,
Hanno H. Weitering
Publication year - 2002
Publication title -
physical review. b, condensed matter
Language(s) - English
Resource type - Journals
eISSN - 1095-3795
pISSN - 0163-1829
DOI - 10.1103/physrevb.65.115424
Subject(s) - conductance , condensed matter physics , van der pauw method , silicon , scattering , substrate (aquarium) , materials science , physics , electrical resistivity and conductivity , electrical resistance and conductance , surface (topology) , optics , optoelectronics , hall effect , quantum mechanics , oceanography , geometry , mathematics , geology
The electrical conductance of atomically clean, reconstructed silicon surfaces was studied as a function of temperature with macroscopic van der Pauw measurements in ultrahigh vacuum. The surface-state conductance of the $\mathrm{Si}(100)2\ifmmode\times\else\texttimes\fi{}1$ surface was measured on a fully depleted silicon-on-insulator (SOI) substrate and on bulk Si. The surface-state conductance has metallic temperature dependence, but its magnitude falls below the universal conductance quantum. The data furthermore reveal a clear signature of the $c(4\ifmmode\times\else\texttimes\fi{}2)\ensuremath{\rightarrow}2\ifmmode\times\else\texttimes\fi{}1$ surface phase transition near 200 K, which indicates that surface scattering increases with decreasing $c(4\ifmmode\times\else\texttimes\fi{}2)$ order on the surface. The surface conductance of $\mathrm{Si}(111)7\ifmmode\times\else\texttimes\fi{}7$ was measured only on a SOI substrate. The temperature coefficient is metallic and the magnitude is larger than the universal conductance quantum.

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