z-logo
open-access-imgOpen Access
Hydrogen molecules trapped by multivacancies in silicon
Author(s) -
Kunie Ishioka,
Masahiro Kitajima,
Seiji Tateishi,
K. Nakanoya,
Naoki Fukata,
Toshiyuki Mori,
K. Murakami,
Shunichi Hishita
Publication year - 1999
Publication title -
physical review. b, condensed matter
Language(s) - English
Resource type - Journals
eISSN - 1095-3795
pISSN - 0163-1829
DOI - 10.1103/physrevb.60.10852
Subject(s) - silicon , atomic physics , hydrogen , atom (system on chip) , dangling bond , raman spectroscopy , ion , materials science , hydrogen atom , physics , optics , optoelectronics , quantum mechanics , computer science , group (periodic table) , embedded system
We report an observation of a Raman line of H2 in silicon after Si+-ion implantation followed by a hydrogen atom treatment. The vibrational frequency of the H2 is 3822 cm-1 between the two different vibrational frequencies, 4158 and 3601 cm-1, of H2 observed so far in silicon. The assignment is confirmed by the observation of isotope shifts to 2770 cm-1 for D2 and to 3353 cm-1 for HD. The ion-fluence dependence of the Raman intensity of the H2 at 3822 cm-1 correlates with the total intensity of peaks in the Si-H stretching region that are attributed to H-terminated dangling bonds in multivacancies and/or interstitial-H complexes. We propose that the hydrogen molecule corresponding to the 3822 cm-1 vibrational line is trapped in or adjacent to H-terminated multivacancies

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom