Hydrogen molecules trapped by multivacancies in silicon
Author(s) -
Kunie Ishioka,
Masahiro Kitajima,
Seiji Tateishi,
K. Nakanoya,
Naoki Fukata,
Toshiyuki Mori,
K. Murakami,
Shunichi Hishita
Publication year - 1999
Publication title -
physical review. b, condensed matter
Language(s) - English
Resource type - Journals
eISSN - 1095-3795
pISSN - 0163-1829
DOI - 10.1103/physrevb.60.10852
Subject(s) - silicon , atomic physics , hydrogen , atom (system on chip) , dangling bond , raman spectroscopy , ion , materials science , hydrogen atom , physics , optics , optoelectronics , quantum mechanics , computer science , group (periodic table) , embedded system
We report an observation of a Raman line of H2 in silicon after Si+-ion implantation followed by a hydrogen atom treatment. The vibrational frequency of the H2 is 3822 cm-1 between the two different vibrational frequencies, 4158 and 3601 cm-1, of H2 observed so far in silicon. The assignment is confirmed by the observation of isotope shifts to 2770 cm-1 for D2 and to 3353 cm-1 for HD. The ion-fluence dependence of the Raman intensity of the H2 at 3822 cm-1 correlates with the total intensity of peaks in the Si-H stretching region that are attributed to H-terminated dangling bonds in multivacancies and/or interstitial-H complexes. We propose that the hydrogen molecule corresponding to the 3822 cm-1 vibrational line is trapped in or adjacent to H-terminated multivacancies
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom