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Two reaction channels directly observed for atomic hydrogen on the Si(111)-7×7 surface
Author(s) -
Kell Mortensen,
D. M. Chen,
P. Bedrossian,
J. A. Golovchenko,
Flemming Besenbacher
Publication year - 1991
Publication title -
physical review. b, condensed matter
Language(s) - French
Resource type - Journals
eISSN - 1095-3795
pISSN - 0163-1829
DOI - 10.1103/physrevb.43.1816
Subject(s) - dangling bond , scanning tunneling microscope , hydrogen , materials science , surface (topology) , spectroscopy , atomic physics , layer (electronics) , quantum tunnelling , scanning tunneling spectroscopy , chemical physics , hydrogen bond , surface reconstruction , molecular physics , silicon , crystallography , nanotechnology , molecule , chemistry , physics , optoelectronics , quantum mechanics , geometry , mathematics
Ces deux canaux de reaction procedent de facon concurrentielle. Il y a une liaison directe des atomes d'hydrogene aux liaisons pendantes existantes de la surface, et un deplacement plus lent de la couche superieure de Si et une liaison des atomes d'hydrogene aux liaisons pendantes creees de la couche suivante

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