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Growth of Rh, Pd, and Pt films on Cu(100)
Author(s) -
George W. Graham,
P. J. Schmitz,
P. A. Thiel
Publication year - 1990
Publication title -
physical review. b, condensed matter
Language(s) - French
Resource type - Journals
eISSN - 1095-3795
pISSN - 0163-1829
DOI - 10.1103/physrevb.41.3353
Subject(s) - chemisorption , materials science , monolayer , auger electron spectroscopy , alloy , metal , electron diffraction , copper , analytical chemistry (journal) , low energy electron diffraction , auger , scattering , phase (matter) , crystallography , diffraction , adsorption , atomic physics , chemistry , metallurgy , nanotechnology , optics , physics , organic chemistry , chromatography , nuclear physics
La croissance des couches deposees par phase vapeur est suivie par spectroscopies Auger et par diffusion des ions lents. On a tendance a rester en surface quand le film croi←t. Cette tendance est forte pour Rh, faible pour Pd et Pt. Ceci est coherent avec des considerations d'energie de surface. Une fraction du metal depose forme des amas, des ilots ou d'autres configurations relativement stables

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