Open AccessUltrafast relaxation dynamics of highly excited hot electrons in silicon
Author(s) -
Hiroshi Tanimura,
J. Kanasaki,
Katsumi Tanimura,
Jelena Sjakste,
Nathalie Vast
Publication year - 2019
Publication title -
physical review. b./physical review. b
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.78
H-Index - 465
eISSN - 2469-9969
pISSN - 2469-9950
DOI - 10.1103/physrevb.100.035201
Subject(s) - brillouin zone , relaxation (psychology) , electron , ultrashort pulse , silicon , excited state , semiconductor , atomic physics , materials science , momentum (technical analysis) , range (aeronautics) , condensed matter physics , physics , laser , optoelectronics , optics , quantum mechanics , psychology , social psychology , finance , economics , composite material
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