Open AccessStructural, Dielectric, and Interface Properties of Crystalline Barium Silicate Films on Si(100): A Robust High-κ
Author(s) -
Suravi Islam,
K.R. Hofmann,
Armin Feldhoff,
H. Pfnür
Publication year - 2016
Publication title -
physical review applied
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.883
H-Index - 75
eISSN - 2331-7043
pISSN - 2331-7019
DOI - 10.1103/physrevapplied.5.054006
Subject(s) - dielectric , materials science , barium , high κ dielectric , silicate , miniaturization , gate dielectric , oxide , thermal stability , interface (matter) , barium titanate , transistor , optoelectronics , chemical engineering , composite material , nanotechnology , electrical engineering , metallurgy , capillary number , voltage , capillary action , engineering
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