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Ronald Charles Newman FInstP. 10 December 1931 — 30 July 2014
Author(s) -
B.A. Joyce
Publication year - 2015
Publication title -
biographical memoirs of fellows of the royal society
Language(s) - English
Resource type - Journals
eISSN - 1748-8494
pISSN - 0080-4606
DOI - 10.1098/rsbm.2016.0004
Subject(s) - gallium arsenide , silicon , epitaxy , dopant , diffusion , semiconductor , impurity , fabrication , engineering physics , materials science , optoelectronics , doping , nanotechnology , physics , medicine , quantum mechanics , alternative medicine , layer (electronics) , pathology
Ronald Charles (Ron) Newman was one of the most versatile semiconductor physicists of his generation and is distinguished for his work in several different areas, most notably epitaxial growth and the behaviour of impurities and dopants in a range of device-related materials, mainly silicon and gallium arsenide. His most significant contributions came from the application of local vibrational-mode spectroscopy to studies of the segregation and diffusion of oxygen and hydrogen in silicon. The results were of fundamental importance in the fabrication of integrated circuits.

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