Cytological changes in chlorhexidine-resistant isolates of Pseudomonas stutzeri | Zendy

Unchalee Tattawasart | Zendy; A.C. Hann | Zendy; JeanYves Maillard | Zendy; J. R. Furr | Zendy; A.D. Russell | Zendy

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Cytological changes in chlorhexidine-resistant isolates of Pseudomonas stutzeri

Author(s) -

Unchalee Tattawasart,

A.C. Hann,

JeanYves Maillard,

J. R. Furr,

A.D. Russell

Publication year - 2000

Publication title -

journal of antimicrobial chemotherapy

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 2.124

H-Index - 194

eISSN - 1460-2091

pISSN - 0305-7453

DOI - 10.1093/jac/45.2.145

Subject(s) - pseudomonas stutzeri , bacterial outer membrane , lysis , chlorhexidine , transmission electron microscopy , microbiology and biotechnology , ultrastructure , chemistry , bacteria , membrane , electron microscope , cytoplasm , pseudomonas aeruginosa , scanning electron microscope , cell membrane , biophysics , biology , materials science , biochemistry , medicine , botany , nanotechnology , genetics , physics , dentistry , escherichia coli , optics , composite material , gene

Transmission electron microscopy (TEM), scanning electron microscopy (SEM) and energy-dispersive analysis of X-ray (EDAX) have been used to examine chlorhexidine diacetate (CHA)-sensitive and -resistant isolates of Pseudomonas stutzeri and to determine the effects of CHA on the cells. Significant differences were observed in the structure, size and elemental composition of CHA-sensitive and -resistant cells. Treatment with CHA produced considerably greater changes in CHA-sensitive cells, with widespread peeling of the outer membrane, a substantial loss of cytoplasmic electron-dense material and extensive lysis. Cells from the resistant isolates showed no blebbing of the outer membrane and no structural damage. X-ray mapping confirmed the difference in CHA uptake between CHA-sensitive and CHA-resistant cells. It is proposed that changes in the outer membrane form a major mechanism of resistance to CHA in P. stutzeri.

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