
Effect of annealing temperature on the microstructure and optical properties of MoS2 films
Author(s) -
Bianlian Zhang,
Cheng Zhang,
Yuan Meng
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/892/1/012007
Subject(s) - annealing (glass) , materials science , microstructure , thin film , sputter deposition , diffraction , composite material , sputtering , optoelectronics , optics , nanotechnology , physics
In this paper, MoS2 films were prepared on silicon and glass substrates by RF magnetron sputtering. The surface morphology, structure and transmission and reflectivity of MoS2 films were characterized by SEM, XRD and spectrometer. The effect of annealing temperature on the properties of MoS2 films was analyzed. The results show that the annealing temperature has an obvious effect on the surface morphology of MoS2 thin films, and different annealing temperature can change the position of XRD diffraction peak of MoS2 thin films. The higher the annealing temperature, the better the growth quality and the higher the transmission and reflectivity of MoS2 film.