Open AccessFormation of C-N-Si Film for Interlayer of Hard Material Coating by Pulsed Discharge Plasma CVD
Author(s) -
Masayuki Noda
Publication year - 2013
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/417/1/012045
Subject(s) - materials science , coating , plasma , composite material , physics , quantum mechanics