Open AccessEvaluation of fast EUV scintillator using 13.9 nm x-ray laser
Author(s) -
Momoko Tanaka,
Yusuke Furukawa,
Hidetoshi Murakami,
Shigeki Saito,
Nobuhiko Sarukura,
Masaharu Nishikino,
Hiroshi Yamatani,
Keisuke Nagashima,
Yuji Kagamitani,
Dirk Ehrentraut,
Tsuguo Fukuda,
Hiroaki Nishimura,
K. Mima
Publication year - 2008
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/112/4/042058
Subject(s) - extreme ultraviolet lithography , scintillator , materials science , lithography , optics , laser , optoelectronics , next generation lithography , x ray lithography , nanosecond , resist , electron beam lithography , physics , nanotechnology , layer (electronics) , detector