Open AccessCluster incorporation control for a-Si:H film deposition
Author(s) -
William Makoto Nakamura,
Hirofumi Miyahara,
Kazunori Koga,
Masaharu Shiratani
Publication year - 2008
Publication title -
journal of physics. conference series
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/100/8/082018
Subject(s) - cluster (spacecraft) , deposition (geology) , volume fraction , materials science , substrate (aquarium) , plasma , chemical vapor deposition , chemical engineering , degradation (telecommunications) , fraction (chemistry) , upstream (networking) , nanotechnology , optoelectronics , chemistry , composite material , chromatography , physics , electronic engineering , computer science , engineering , nuclear physics , geology , paleontology , sediment , computer network , oceanography , programming language