Open AccessOn the effect of the substrate pretreatment parameters on the composition and structure of plasma deposited SiO2thin films
Author(s) -
Ch. Voulgaris,
E. Amanatides,
D. Mataras,
D. Rapakoulias
Publication year - 2005
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/10/1/051
Subject(s) - substrate (aquarium) , plasma , materials science , thin film , adhesion , aqueous solution , dry etching , aluminium , plasma etching , magnesium , chemical engineering , plasma cleaning , composition (language) , etching (microfabrication) , analytical chemistry (journal) , composite material , nanotechnology , metallurgy , chemistry , chromatography , layer (electronics) , organic chemistry , oceanography , physics , quantum mechanics , geology , engineering , philosophy , linguistics