Open Access3D growth of silicon nanowires under pure hydrogen plasma at low temperature (250 °C)
Author(s) -
Kai Yang,
Nathalie Coulon,
Anne Claire Salaun,
Laurent Pichon
Publication year - 2020
Publication title -
nanotechnology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.926
H-Index - 203
eISSN - 1361-6528
pISSN - 0957-4484
DOI - 10.1088/1361-6528/abc2ee
Subject(s) - materials science , nanowire , indium , silicon , hydrogen , plasma , amorphous solid , silicon nanowires , nanotechnology , chemical engineering , analytical chemistry (journal) , optoelectronics , crystallography , organic chemistry , chemistry , physics , quantum mechanics , engineering
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