Analysing quantized resistance behaviour in graphene Corbino p-n junction devices
Author(s) -
ChiehI Liu,
D. S. Scaletta,
Dinesh K. Patel,
Mattias Kruskopf,
Antonio Levy,
Heather M. Hill,
Albert F. Rigosi
Publication year - 2020
Publication title -
journal of physics d applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.857
H-Index - 198
eISSN - 1361-6463
pISSN - 0022-3727
DOI - 10.1088/1361-6463/ab83bb
Subject(s) - graphene , mesoscopic physics , scalability , resistor , lithography , optoelectronics , materials science , fabrication , nanotechnology , physics , computer science , condensed matter physics , voltage , quantum mechanics , database , alternative medicine , medicine , pathology
Just a few of the promising applications of graphene Corbino pn J devices include two-dimensional Dirac fermion microscopes, custom programmable quantized resistors, and mesoscopic valley filters. In some cases, device scalability is crucial, as seen in fields like resistance metrology, where graphene devices are required to accommodate currents of the order 100 μA to be compatible with existing infrastructure. However, fabrication of these devices still poses many difficulties. In this work, unusual quantized resistances are observed in epitaxial graphene Corbino p-n junction devices held at the ν = 2 plateau ( R H ≈ 12906 Ω) and agree with numerical simulations performed with the LTspice circuit simulator. The formulae describing experimental and simulated data are empirically derived for generalized placement of up to three current terminals and accurately reflects observed partial edge channel cancellation. These results support the use of ultraviolet lithography as a way to scale up graphene-based devices with suitably narrow junctions that could be applied in a variety of subfields.
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