Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores | Zendy

V. Nazmov | Zendy; B. G. Goldenberg | Zendy; A. L. Vasiliev | Zendy; В. Е. Асадчиков | Zendy

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Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores

Author(s) -

V. Nazmov,

B. G. Goldenberg,

A. L. Vasiliev,

В. Е. Асадчиков

Publication year - 2021

Publication title -

journal of micromechanics and microengineering

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.494

H-Index - 132

eISSN - 1361-6439

pISSN - 0960-1317

DOI - 10.1088/1361-6439/abf331

Subject(s) - fabrication , polyethylene terephthalate , materials science , lithography , x ray lithography , aspect ratio (aeronautics) , substrate (aquarium) , high resolution , resist , beam (structure) , optoelectronics , optics , nanotechnology , composite material , physics , medicine , alternative medicine , pathology , layer (electronics) , oceanography , remote sensing , geology

Patterning using a focused ionizing radiation beam provides a high spatial resolution but is not feasible when creating large arrays of microstructures. We propose the optimization of x-ray lithography parameters to create submicropores in a low-sensitivity material (polyethylene terephthalate) using a wide x-ray beam. This optimization results in the fabrication of regularly arranged micropores with a high aspect ratio (over 20) and diameters of up to 0.4 µ m across a large substrate area (up to several square centimeters).

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