Open AccessDeposition and patterning of electrodes on the vertical sidewalls of deep trenches
Author(s) -
Lucas Bonnin,
Alain Piot,
N. Isac,
Alain Bosseboeuf
Publication year - 2020
Publication title -
journal of micromechanics and microengineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.494
H-Index - 132
eISSN - 1361-6439
pISSN - 0960-1317
DOI - 10.1088/1361-6439/aba377
Subject(s) - wafer , shadow mask , materials science , electrode , photoresist , etching (microfabrication) , optoelectronics , substrate (aquarium) , deep reactive ion etching , rotation (mathematics) , photolithography , optics , deposition (geology) , reactive ion etching , nanotechnology , chemistry , geometry , paleontology , physics , oceanography , layer (electronics) , mathematics , biology , sediment , geology
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