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Reobserving the Extreme-Ultraviolet Emission from Abell 2199: In Situ Measurement of Background Distribution by Offset Pointing
Author(s) -
Richard Lieu,
Massimiliano Bonamente,
Jonathan P. D. Mittaz,
F. Durret,
Sérgio Dos Santos,
J. S. Kaastra
Publication year - 1999
Publication title -
the astrophysical journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.376
H-Index - 489
eISSN - 1538-4357
pISSN - 0004-637X
DOI - 10.1086/312401
Subject(s) - physics , astrophysics , extreme ultraviolet , extreme ultraviolet lithography , offset (computer science) , cluster (spacecraft) , astronomy , point source , background subtraction , point spread function , optics , laser , pixel , computer science , programming language
The EUV excess emission from the clusters A2199 and A1795 remains an unexplained astrophysical phenomenon. There has been many unsuccessful attempts to "trivialize" the findings. In this Letter, we present direct evidence proving that the most recent of such attempts, which attributes the detected signals to a background nonuniformity effect, is likewise excluded. We address the issue by a reobservation of A2199 that features a new filter orientation, usage of a more sensitive part of the detector, and, most crucially, the inclusion of a background pointing at approximately 2 degrees offset-the first in situ measurement of its kind. We first demonstrate quantitatively two facts: (1) the offset pointing provides an accurate background template for the cluster observation, while (2) data from other blank fields do not. We then performed a point-to-point subtraction of the in situ background from the cluster field, with an appropriate propagation of errors. The resulting cluster radial profile is consistent with that obtained by our original method of subtracting a flat asymptotic background. The emission now extends to a radius of 20&arcmin;; it confirms the rising prominence of EUV excess beyond approximately 5&arcmin; as previously reported.

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