Open AccessStructural evolution and mechanical properties of nitrogen doped hydrogenated amorphous silicon thin films
Author(s) -
Rui Xu,
Kai Yang,
Tianqi Zhao,
Li Jiang
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/6.0000003
Subject(s) - materials science , thin film , chemical vapor deposition , silicon , amorphous silicon , raman spectroscopy , amorphous solid , fourier transform infrared spectroscopy , hydrogen , silicon nitride , analytical chemistry (journal) , plasma enhanced chemical vapor deposition , carbon film , nitrogen , chemical engineering , crystalline silicon , nanotechnology , crystallography , chemistry , metallurgy , optics , organic chemistry , physics , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom