Open AccessInjection of low-energy SiCH5+ ion-beam to Si substrate during chemical vapor deposition process using methylsilane
Author(s) -
Satoru Yoshimura,
Satoshi Sugimoto,
Takae Takeuchi,
Kensuke Murai,
Masato Kiuchi
Publication year - 2022
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0125209
Subject(s) - chemical vapor deposition , fourier transform infrared spectroscopy , analytical chemistry (journal) , substrate (aquarium) , ion beam assisted deposition , ion , silicon , ion beam , materials science , deposition (geology) , infrared spectroscopy , chemistry , chemical engineering , nanotechnology , optoelectronics , organic chemistry , paleontology , oceanography , sediment , geology , engineering , biology
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