Overcoming metal-rich surface chemistry limitations of ScAlN for high electrical performance heterostructures
Author(s) -
Zachary Engel,
Keisuke Motoki,
Christopher M. Matthews,
W. Alan Doolittle
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0121621
Subject(s) - heterojunction , molecular beam epitaxy , substrate (aquarium) , epitaxy , surface roughness , high electron mobility transistor , sheet resistance , electron diffraction , optoelectronics , materials science , surface finish , metal , electron mobility , chemistry , transistor , analytical chemistry (journal) , nanotechnology , diffraction , optics , metallurgy , composite material , voltage , geology , oceanography , physics , layer (electronics) , quantum mechanics , chromatography
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