
Overcoming metal-rich surface chemistry limitations of ScAlN for high electrical performance heterostructures
Author(s) -
Zachary Engel,
Keisuke Motoki,
Christopher M. Matthews,
W. Alan Doolittle
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0121621
Subject(s) - heterojunction , molecular beam epitaxy , substrate (aquarium) , epitaxy , surface roughness , electron diffraction , high electron mobility transistor , sheet resistance , metal , surface finish , optoelectronics , materials science , chemistry , analytical chemistry (journal) , transistor , diffraction , nanotechnology , metallurgy , optics , composite material , voltage , oceanography , physics , layer (electronics) , quantum mechanics , chromatography , geology