Open AccessResponse to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)]
Author(s) -
Mark A. Sobolewski,
J.-H. Kim
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0109603
Subject(s) - plasma , inductively coupled plasma , electron density , radio frequency , atomic physics , electron temperature , electron , chemistry , physics , condensed matter physics , materials science , analytical chemistry (journal) , quantum mechanics , electrical engineering , chromatography , engineering
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