Open AccessImproved resistance to oxidation of Ge-doped Fe3O4 thin films with cation excess composition using a sputtering target of FeO
Author(s) -
Seishi Abe
Publication year - 2022
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0102338
Subject(s) - sputtering , doping , thin film , materials science , analytical chemistry (journal) , stoichiometry , magnetization , chemistry , nanotechnology , optoelectronics , physics , chromatography , quantum mechanics , magnetic field
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom