Open AccessStochasticity in extreme-ultraviolet lithography predicted by principal component analysis of Monte Carlo simulated event distributions in resist films
Author(s) -
Hiroshi Fukuda
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0101696
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , principal component analysis , resist , monte carlo method , lithography , probability distribution , physics , optics , statistical physics , materials science , nanotechnology , statistics , mathematics , laser , layer (electronics)
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