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Comment on “The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor” [J. Appl. hys. 102, 113302 (2007)]
Author(s) -
Miaomiao Du,
Zhenfeng Ding
Publication year - 2022
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/5.0101636
Subject(s) - plasma , inductively coupled plasma , radio frequency , electron , electron density , atomic physics , physics , key (lock) , materials science , condensed matter physics , computational physics , chemistry , quantum mechanics , computer science , telecommunications , computer security

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