Open AccessOptimization of growth parameters to obtain epitaxial large area growth of molybdenum disulfide using pulsed laser deposition
Author(s) -
Dhanvini Gudi,
Payel Sen,
Andres Alejandro Forero Pico,
Dipanjan Nandi,
Manisha Gupta
Publication year - 2022
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0098045
Subject(s) - materials science , thin film , pulsed laser deposition , monolayer , annealing (glass) , chemical vapor deposition , molybdenum disulfide , epitaxy , optoelectronics , chemical engineering , substrate (aquarium) , analytical chemistry (journal) , fluence , layer (electronics) , nanotechnology , laser , composite material , optics , chemistry , oceanography , physics , chromatography , geology , engineering
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