Open AccessModeling the temporal evolution and stability of thin evaporating films for wafer surface processing
Author(s) -
Max Huber,
Xiao Hu,
Andreas Zienert,
Jörg Schuster,
Stefan E. Schulz
Publication year - 2022
Publication title -
the journal of chemical physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.071
H-Index - 357
eISSN - 1089-7690
pISSN - 0021-9606
DOI - 10.1063/5.0097409
Subject(s) - disjoining pressure , gibbs free energy , evaporation , adsorption , thermodynamics , density functional theory , ab initio , chemistry , surface energy , ab initio quantum chemistry methods , thin film , diffusion , wafer , chemical physics , materials science , computational chemistry , molecule , nanotechnology , physics , organic chemistry
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