Open AccessTailoring the electronic properties of nickel silicide by interfacial modification
Author(s) -
Xiulan Xu,
Yiya Huang,
Risi Guo,
Guanghua Yu
Publication year - 2022
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/5.0097185
Subject(s) - materials science , silicide , sheet resistance , microstructure , thin film , sputter deposition , phase (matter) , substrate (aquarium) , silicon , nickel , optoelectronics , sputtering , composite material , layer (electronics) , metallurgy , nanotechnology , chemistry , oceanography , organic chemistry , geology
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