Structural properties of NiO thin films deposited by DC magnetron sputtering: Influence of the preparing features
Author(s) -
Ali Adnan Abd Alwahab,
Najwa J. Jubier,
Jafer Fahdel Odah
Publication year - 2022
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/5.0094718
Subject(s) - materials science , non blocking i/o , argon , thin film , nickel oxide , surface roughness , diffraction , nickel , oxide , deposition (geology) , sputter deposition , analytical chemistry (journal) , layer (electronics) , phase (matter) , sputtering , composite material , nanotechnology , optics , metallurgy , chemistry , catalysis , paleontology , biochemistry , physics , organic chemistry , chromatography , sediment , biology
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